论文标题

迈向密集等离子体焦点理论的第一步:第1部分:具有内置繁殖延迟和非零厚度的密集鞘的运动框架,用于广义电极几何形状

First steps towards a theory of the Dense Plasma Focus: Part-I: Kinematic framework with built-in propagation delay and nonzero thickness of dense sheath for generalized electrode geometry

论文作者

Auluck, S K H

论文摘要

本文是系列的第一部分,描述了密集等离子体焦点理论的运动框架,该框架与精神上的GV模型非常相似,但在四个方面的范围有所不同。首先,GV模型来自大部分结果,其结果来自从显然代表动量保护的假设中得出的特定部分微分方程的数学属性,但并不是相关物理学的严格应用。本模型基于标准运动方程的缩放属性,这导致数学结果与GV模型相同。其次,GV模型本质上是纯粹的运动学。当前的模型也像GV模型一样运动学,但它结合了从其他物理理论,模型和实验中借来的其他见解。第三,GV模型没有考虑到血浆传播的开始和开始的实验观察到的延迟,并且存在致密等离子体鞘的非零厚度。本模型将这两种特征都包含在其运动学结构中。第四,与GV模型不同,本模型允许考虑标准Mather型几何形状的某些修改。除了电流波形外,提出的模型还重现了捏柱的高度和半径,捏密度与填充密度的比率,伞状的一般外观,如等离子体谱和条纹图像以及形成有界的3维等离子体结构,嵌入了夹紧等离子体内,而无需考虑物质细节的细节。

This paper, Part I of a series, describes a kinematic framework for the theory of a Dense Plasma Focus which is very similar to the GV model in spirit but which differs in its scope in four respects. First, the GV model derives most of its results from the mathematical properties of the solution of a certain partial differential equation derived from assumptions that apparently represent conservation of momentum but are not a rigorous application of the relevant physics. The present model is based on the scaling properties of the standard equations of motion, which lead to mathematical results identical with the GV model. Second, the GV model is purely kinematic in nature. The present model is also kinematic like the GV model but it incorporates additional insights borrowed from other physical theories, models and experiments. Third, the GV model does not take into account the experimentally observed delay between the start of current and start of plasma propagation and the existence of a nonzero thickness of the dense plasma sheath. The present model incorporates both these features in its kinematic structure. Fourth, the unlike the GV model, the present model allows considerations of some modifications of standard Mather type geometry. In addition to the current waveform, the proposed model reproduces the height and radius of the pinch column, the ratio of pinch density to fill density, the general appearance of the umbrella like plasma profile and streak picture and formation of bounded 3-dimensional plasma structures embedded within the pinch plasma without taking into account microscopic details of physical phenomena

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