论文标题
$ \ varepsilon $ -fe $ _2 $ o $ $ _3 $ / gan外延层的结构特殊性,高分辨率传输电子显微镜和中子反射测定法
Structural peculiarities of $\varepsilon$-Fe$_2$O$_3$ / GaN epitaxial layers unveiled by high-resolution transmission electron microscopy and neutron reflectometry
论文作者
论文摘要
本文专门用于在脉冲激光量产生的脉冲激光重构氧化物($ \ varepsilon $ -fe $ _2 $ o $ _3 $)中出现的晶体学特征的结构研究($ \ varepsilon $ -fe $ _2 $ _3 $)。纳米级$ \ VAREPSILON $ -FE $ _2 $ o $ _3 $电影的柱状结构首次使用高分辨率电子显微镜(HRTEM)直接空间技术进行了调查,该直接空间技术是由对等空间空间方法补充的,该方法是由高能源电子衍射和色彩衍射和色增强型和色增强的Hrtem hrtem fortrtem filtering fortring fortering fortring formering formering。 $ \ varepsilon $ -fe $ _2 $ o $ _3 $ _3 $ / gan界面形成通过中子反射测定法和能量分散X射线光谱的深度分析,进一步扩展了对密度和化学成分的深度分析。所获得的结果将光浮出在属性的属性和起源上,几纳米厚的低密度过渡层位于$ \ varepsilon $ -fe $ _2 $ _2 $ o $ $ _3 $ / gan接口。据信,详细了解该层的性质对于开发$ \ varepsilon $ -fe $ _2 $ _2 $ _3 $ _3 $ _3 $ _3 $ _3 $ _3 $ _3 $ / gan异质结构,这些异质结构可能会成为具有室温磁电磁力磁场的基于铁氧化物的高氧化物氧化铁 - 氧化物 - 氧化物 - 氧化物型型。
The present paper is dedicated to the structural study of crystallographic peculiarities appearing in epitaxial films of metastable epsilon iron oxide ($\varepsilon$-Fe$_2$O$_3$) grown by pulsed laser deposition onto a semiconductor GaN (0001) substrate. The columnar structure of the nanoscale $\varepsilon$-Fe$_2$O$_3$ films has been for the first time investigated using high resolution electron microscopy (HRTEM) direct space technique complemented by reciprocal space methods of high-energy electron diffraction and color-enhanced HRTEM image Fourier filtering. The study of $\varepsilon$-Fe$_2$O$_3$ / GaN interface formation has been further expanded by carrying out a depth resolved analysis of density and chemical composition by neutron reflectometry and energy-dispersive X-ray spectroscopy. The obtained results shed light onto the properties and the origin of the enigmatic few-nanometer thick low density transition layer residing at the $\varepsilon$-Fe$_2$O$_3$ / GaN interface. A detailed knowledge of the properties of this layer is believed to be highly important for the development of $\varepsilon$-Fe$_2$O$_3$ / GaN heterostructures that can potentially become part of the iron-oxide based ferroic-on-semiconductor devices with room temperature magneto-electric coupling.