论文标题
使用相边界测量值的NB膜进行超导Qubit的表征
Characterization of Nb films for superconducting qubits using phase boundary measurements
论文作者
论文摘要
超导量子性能的持续进展需要对许多腐蚀来源进行更详细的理解。在这些设备中,由于缺陷,界面和晶界,出现了两级系统,被认为是Millikelvin温度下的Qubit退积的主要来源。除了Al,NB是用于超导Qubits的常用金属化层。因此,需要付出重大努力来开发和限定减轻NB电影中缺陷的过程。由于制造完整的超导码头及其在Millikelvin温度下的表征是一个时间和资源密集型过程,因此希望拥有可以快速表征膜特性并评估不同处理的测量工具。在这里,我们表明,使用非常高的分辨率显示特征,与应用的外界$ h $(相边界$ t_c -h $的)使用外部磁场$ h $(相位边界$ t_c -h $)的变化的测量值与NB膜的结构直接相关。结合X射线衍射测量值,我们表明,甚至可以通过测得的超导相边界中的小但可重现的变化来区分NB膜中晶粒的变化质量和晶体方向。
Continued advances in superconducting qubit performance require more detailed understandings of the many sources of decoherence. Within these devices, two-level systems arise due to defects, interfaces, and grain boundaries, and are thought to be a major source of qubit decoherence at millikelvin temperatures. In addition to Al, Nb is a commonly used metalization layer for superconducting qubits. Consequently, a significant effort is required to develop and qualify processes that mitigate defects in Nb films. As the fabrication of complete superconducting qubits and their characterization at millikelvin temperatures is a time and resource intensive process, it is desirable to have measurement tools that can rapidly characterize the properties of films and evaluate different treatments. Here we show that measurements of the variation of the superconducting critical temperature $T_c$ with an applied external magnetic field $H$ (of the phase boundary $T_c - H$) performed with very high resolution show features that are directly correlated with the structure of the Nb films. In combination with x-ray diffraction measurements, we show that one can even distinguish variations quality and crystal orientation of the grains in a Nb film by small but reproducible changes in the measured superconducting phase boundary.