论文标题

抗铁磁拓扑绝缘子中的零线模式

Layer Zero-Line Modes in Antiferromagnetic Topological Insulators

论文作者

Liang, Wenhao, Hou, Tao, Zeng, Junjie, Liu, Zheng, Han, Yulei, Qiao, Zhenhua

论文摘要

最近,磁性域壁已经在抗磁性拓扑绝缘子MNBI $ _2 $ TE $ _4 $中实验观察到,我们发现拓扑零线模式(ZLMS)出现在域墙壁上。在这里,我们从理论上证明了这些ZLM在MNBI $ _2 $ TE $ _4 $多层中依赖于层。对于具有平面外铁磁性的域壁,我们发现ZLM平均分布在奇数层中。当域壁具有平面内磁化时,由于平面镜像对称性断裂,ZLM也可以在偶数层中存在。此外,导电通道主要分布在最外层的层,层厚度增加。我们的发现制定了操纵ZLM的策略,也可以利用来区分相应的磁性结构。

Recently, the magnetic domain walls have been experimentally observed in antiferromagnetic topological insulators MnBi$_2$Te$_4$, where we find that the topological zero-line modes (ZLMs) appear along the domain walls. Here, we theoretically demonstrate that these ZLMs are layer-dependent in MnBi$_2$Te$_4$ multilayers. For domain walls with out-of-plane ferromagnetism, we find that ZLMs are equally distributed in the odd-number layers. When domain walls possess in-plane magnetization, the ZLMs can also exist in even-number layers due to in-plane mirror-symmetry breaking. Moreover, the conductive channels are mainly distributed in the outermost layers with increasing layer thickness. Our findings lay out a strategy in manipulating ZLMs and also can be utilized to distinguish the corresponding magnetic structures.

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