论文标题
使用非扰动的第三和第五谐波生成探测硅表面和硅 - 硅界面
Probing the surface of silicon and the silicon-silica interface using nonperturbative third and fifth harmonic generation
论文作者
论文摘要
我们在向后的（反射）几何形状中检查了位于硅表面上的深层和真空紫外线的第三和第五谐波的产生，当时在硅和硅片之间的硅和硅之间的界面上生长在硅底物上。在这两种情况下，都发现了谐波信号对驱动激光束极化方向的强烈依赖性。两个样本观察到的差异都在定性上解释。此外，引入了对极化依赖性的简化张量形式，这揭示了表面和界面的结构对称性，并以高精度描述了极化依赖性。这项研究是进一步了解材料边界上非线性相互作用和非扰动谐波产生的重要步骤。
We examined, in backward (reflection) geometry, the generation of the 3rd and 5th harmonics, located in the deep and vacuum ultraviolet, on the surface of silicon and on the interface between silicon and silica when a thin silica film was grown on a silicon substrate. In both cases, a strong dependence of the harmonic signal on the polarization direction of the driving laser beam was found. The differences observed for both samples, are qualitatively explained. Furthermore, a simplified tensor formalism for the polarization dependence is introduced, which reveals the structural symmetry of the surface and the interface and describes the polarization dependence with high accuracy. The study is an essential step to further understand nonlinear interaction and nonperturbative harmonic generation on the boundaries of materials.
