论文标题
MOS2结构的工程摩擦特性通过调整厚度和形态 - 一种原子,电子结构和激子分析
Engineering frictional characteristics of MoS2 structure by tuning thickness and morphology- An atomic, electronic structure, and exciton analysis
论文作者
论文摘要
我们进行了原子和电子动力学分析,以研究MOS2系统通过钻石尖端的形态和厚度变化对其摩擦学性质的影响。我们考虑了4例:可变层(1-4层)和数字(2-8凹痕),半径(12Å,16Å,20Å,24Å)和凹痕模式(0°,25°,30°,35°,45°,45°,60°),导致18个子例酶。 MD结果表明,变化的半径和凹痕数量最多,层和凹痕模式的数量是调整摩擦特征的最小有效方法。基态AB-Initio研究表明,凹痕的数量和半径增加,增加了拉伸键的数量。因此,同型ISO表面覆盖的体积增加,Lumo的体积减小。这使得较高的面积/体积可用于损失/共享电子,从而导致层和尖端之间的互锁更强。 TD-DFT计算证明了界面激子的存在,尽管Lumo ISO-Surfaces的面积/体积有收缩,但在层的表面和尖端之间的互锁也更强。我们认为,这些层间激子会导致凹痕数亚案例的平均z轴(因此摩擦力)反作用力,而随着凹痕的数量和半径的增加,凹痕半径子案例的较低。
We performed atomic and electron dynamics analysis to study the impact of morphological and thickness changes of a MoS2 system on its tribological properties through a diamond tip. We had considered 4 cases: variable layers (1-4 layers) and number (2-8 indents), radius (12Å, 16Å, 20Å, 24Å), and pattern of indents (0°, 25°, 30°, 35°, 45°, 60°) resulting into 18 subcases. MD results showed changing the radius and number of indents were the most, and number of layers and indents' pattern were the least effective way to tune the frictional characteristics. Ground state ab-initio study demonstrated an increase in the number and radius of indents, raising the number of stretched bonds. Consequently, the volume covered by the HOMO iso-surface increases, and that of LUMO decreases. That makes higher area/volume available to lose/share electrons, resulting in stronger interlocking between layers and tip. And TD-DFT calculation proves the existence of interfacial excitons, resulting in stronger interlocking between the layer's surface and tip despite a contraction in the LUMO iso-surfaces' area/volume. We believe these interlayer excitons result in higher average Z-axis(hence frictional force) reaction forces for the indents number subcases and lower for indents radius subcases as the number and radius of indents increase.