论文标题

掺杂镍氧化物中缺陷的光吸收和排放

Light absorption and emission by defects in doped nickel oxide

论文作者

Karsthof, Robert, Frodason, Ymir Kalmann, Galeckas, Augustinas, Weiser, Philip Michael, Zviagin, Vitaly, Grundmann, Marius

论文摘要

镍氧化物是一种多功能的P型半导体氧化物,在光电设备中有许多应用,但是通常需要高掺杂浓度来达到必要的电导率。与许多其他透明的氧化物半导体相反,即使是中等水平的NIO掺杂水平也会导致可见光谱范围内的显着光吸收,从而限制了材料的应用范围。这种相关性已在文献中广泛报道,但迄今为止其起源尚不清楚。这项工作结合了来自各种NIO样品的光学性质的实验数据,以及杂交密度功能理论计算的结果。它表明,强的电子相互作用导致从价带最大值到缺陷状态的电子过渡的显着蓝移(0.6-1 eV),相对于热力学电荷过渡水平。这本质上是通过在中等掺杂水平下通过缺陷带形成的NiO狭窄的差距半导体,具有强光吸收的光子能量约为1 eV。该计算也证明与NIO中与缺陷相关的光发射的实验数据完全一致。

Nickel oxide is a versatile p-type semiconducting oxide with many applications in opto-electronic devices, but high doping concentrations are often required to achieve necessary electrical conductivity. In contrast to many other transparent oxide semiconductors, even moderate levels of doping of NiO can lead to significant optical absorption in the visible spectral range, limiting the application range of the material. This correlation has been reported extensively in literature, but its origin has been unknown until now. This work combines experimental data on optical properties from a variety of NiO samples with results from hybrid density functional theory calculations. It shows that strong electron-phonon interaction leads to a significant blue shift (0.6-1 eV) of electronic transitions from the valence band maximum to defect states by light absorption with respect to the thermodynamic charge transition levels. This essentially renders NiO a narrow-gap semiconductor by defect band formation already at moderate doping levels, with strong light absorption for photon energies of approximately 1 eV. The calculations are also shown to be fully consistent with experimental data on defect-related light emission in NiO.

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