论文标题
使用电阻不对称来推断铸造图案的纳米光子结构的几何形状
Using electrical resistance asymmetries to infer the geometric shapes of foundry patterned nanophotonic structures
论文作者
论文摘要
尽管硅光子学利用了微电子行业的纳米制作工具和技术，但它也从同一工业中继承了计量方法。光子制造本质上与微电子对3D形状和几何形状的固有敏感性不同，尤其是在诸如硅在隔离器上的高点对比平台中。在这项工作中，我们表明，原理可以使用电阻测量来推断此类纳米光子结构的几何形状，并重建铸造蚀刻过程的微载曲线。我们实施了从标准的硅光子铸造厂推断出3D几何形状的想法，并讨论了需要校准以提高重建精度的一些潜在错误来源。
While silicon photonics has leveraged the nanofabrication tools and techniques from the microelectronics industry, it has also inherited the metrological methods from the same. Photonics fabrication is inherently different from microelectronics in its intrinsic sensitivity to 3D shape and geometry, especially in a high-index contrast platform like silicon-on-insulator. In this work, we show that electrical resistance measurements can in principle be used to infer the geometry of such nanophotonic structures and reconstruct the micro-loading curves of foundry etch processes. We implement our ideas to infer 3D geometries from a standard silicon photonics foundry and discuss some of the potential sources of error that need to be calibrated out to improve the reconstruction accuracy.
