论文标题

如何报告和基准测试新兴现场效应晶体管

How to Report and Benchmark Emerging Field-Effect Transistors

论文作者

Cheng, Zhihui, Pang, Chin-Sheng, Wang, Peiqi, Le, Son T., Wu, Yanqing, Shahrjerdi, Davood, Radu, Iuliana, Lemme, Max C., Peng, Lian-Mao, Duan, Xiangfeng, Chen, Zhihong, Appenzeller, Joerg, Koester, Steven J., Pop, Eric, Franklin, Aaron D., Richter, Curt A.

论文摘要

在设备应用中,已经研究了新兴的低维纳米材料作为现场效应晶体管(FET)。但是,由于多个设备参数的参与和相互关联,正确报告和比较设备性能是具有挑战性的。更重要的是,该研究社区的跨学科性导致缺乏一致的报告和基准指南。在这里,我们向作者报告了有关报告和基准测试重要的FET参数和绩效指标的指南的共识。我们提供了二维(2D)半导体FET的报告和基准测试过程的示例。我们的共识将有助于促进改进的方法来评估新兴FET中的设备性能,从而帮助该领域更加一致,有意义。

Emerging low-dimensional nanomaterials have been studied for decades in device applications as field-effect transistors (FETs). However, properly reporting and comparing device performance has been challenging due to the involvement and interlinking of multiple device parameters. More importantly, the interdisciplinarity of this research community results in a lack of consistent reporting and benchmarking guidelines. Here we report a consensus among the authors regarding guidelines for reporting and benchmarking important FET parameters and performance metrics. We provide an example of this reporting and benchmarking process for a two-dimensional (2D) semiconductor FET. Our consensus will help promote an improved approach for assessing device performance in emerging FETs, thus aiding the field to progress more consistently and meaningfully.

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