论文标题
使用一对非连续性平面波在无限平板上调整辐射压力
Tailoring radiation pressure on infinite slab using pair of non-collinear plane waves
论文作者
论文摘要
电磁场在物质上施加辐射压力，并倾向于分别由于净光学拉力或推动力而向后或向前移动。在这项工作中，我们通过使用两个线性（圆形）极化平面波揭示了介电（手性）平板上局部正和负辐射压力的有趣现象。在这方面，我们首次发展了一种理论，描述了由于两种倾斜（非共线）光源之间的干扰而出现的局部辐射压力。在这种{情况}下，辐射压力在很大程度上取决于入射角，电磁场的极化和平板的手性参数（在手性培养基的情况下）。我们的数值分析表明，由于两个入射平面波引起的介电或手性板上施加的辐射压力在平板上是正常发射率的恒定，并且在斜发生率的局部变化，这确实遵循所有入射角的保护法。预计结果可能会在软件的光学操纵中发现富有成果的应用，例如，细胞膜，手性表面和其他软材料
The electromagnetic field exerts radiation pressure on the matter and tends to move it either in the backward or forward direction due to net optical pulling or pushing force, respectively. In this work, we reveal an interesting phenomenon of a local positive and negative radiation pressure on a dielectric (chiral) slab by using two linearly (circularly) polarized plane waves. In this regard, we develop for the first time, a theory to describe the local radiation pressure appearing due to the interference between the two obliquely impinging (non-collinear) light sources. Under this {situation}, the radiation pressure strongly depends on the angle of incidence, the polarization of the electromagnetic field and the chirality parameters of the slab (in the case of chiral medium). Our numerical analysis shows that the radiation pressure, exerted on a dielectric or a chiral slab due to the two incident plane waves, is constant over the slab for normal incidence, and it varies locally for an oblique incidence, which indeed follows the conservation laws at all incident angles. It is expected that the results may find fruitful applications in optical manipulation of soft matters, for instance, cell membranes, chiral surfaces and other soft materials
