论文标题
Lennard-Jones Crystal的自我散布
Self-Sputtering of the Lennard-Jones Crystal
论文作者
论文摘要
（100）面式的立方体（FCC）晶体表面的自动输出屈服与与Lennard-Jones（LJ）相互作用的颗粒组成，作为归一化入射粒子动能的函数，以正常入射率。由于自输入的产量仅取决于标准化的入射能，因此此处介绍的收益曲线是通用曲线，独立于Lennard-Jones参数，因此是LJ系统的基本参考数据。还将自动输出屈服数据与某些金属的实验获得的自动输出收益率进行了比较，这表明在相对较低的离子入射能量中，大部分发生沉积的一致性。在较高的离子能量下，这种LJ材料的自传并不代表真实固体的材料。这是因为LJ电位的排斥性相互作用并不能代表短距离的实际原子的排斥相互作用。对于某些选定的归一化能量，也提出了自动输出屈服的角度依赖性。
The self-sputtering yield of the (100) face-centered cubic (fcc) crystal surface consisting of particles interacting with the Lennard-Jones (LJ) potential is presented as a function of the normalized incident particle kinetic energy for normal incidence. Because the self-sputtering yield depends only on the normalized incident energy, the yield curve presented here is the universal curve, independent of the Lennard-Jones parameters, and therefore serves as the fundamental reference data for the LJ system. The self-sputtering yield data are also compared with experimentally obtained self-sputtering yields of some metals, which shows reasonable agreement at relatively low ion incident energy where mostly deposition occurs. At higher ion energy, the self-sputtering of such an LJ material does not represent those of real solids. This is because the repulsive interactions of the LJ potential do not represent those of actual atoms at short distances. The angle dependence of the self-sputtering yield is also presented for some selected normalized energies.
