论文标题
平面硅超材料透镜阵列,用于毫米波长成像
Planar Silicon Metamaterial Lenslet Arrays for Millimeter-wavelength Imaging
论文作者
论文摘要
毫米和亚毫米计波长的检测器的大型成像阵列具有应用于宇宙微波背景(CMB)中微弱极化信号的测量以及亚毫米计天体物理学。我们正在开发平面透镜阵列,用于使用使用硅晶片制造的超石材制造的超材料的毫米波长成像。与传统的半球形透镜阵列相比,这种超材料技术具有许多潜在的优势,包括高精度和同质性,平面整合抗反射层以及与硅探测器晶片相匹配的热膨胀系数。在这里,我们描述了使用在硅上图案上图案的金属网以及金属网和蚀刻 - 孔孔层材料抗反重新反射层组合的梯度指数(Grin)超材料透镜的设计过程。我们使用散装物质模型优化设计,以快速模拟和迭代透镜设计。我们制造了原型笑超材料透镜阵列,并将其安装在极性/Simons阵列90/150〜GHz带过渡边缘传感器(TES)BOLOMER TENMOR TENTECTER阵列,带有弯曲的平面天线。原型镜头阵列的光束测量与模型模拟相当吻合。我们计划进一步优化设计并将其与宽带抗反重涂层结合使用,以实现超过70--350〜GHz带宽的运行。
Large imaging arrays of detectors at millimeter and submillimeter wavelengths have applications that include measurements of the faint polarization signal in the Cosmic Microwave Background (CMB), and submillimeter astrophysics. We are developing planar lenslet arrays for millimeter-wavelength imaging using metamaterials microlithically fabricated using silicon wafers. This metamaterial technology has many potential advantages compared to conventional hemispherical lenslet arrays, including high precision and homogeneity, planar integrated anti-reflection layers, and a coefficient of thermal expansion matched to the silicon detector wafer. Here we describe the design process for a gradient-index (GRIN) metamaterial lenslet using metal-mesh patterned on silicon and a combination of metal-mesh and etched-hole metamaterial anti-reflection layers. We optimize the design using a bulk-material model to rapidly simulate and iterate on the lenslet design. We fabricated prototype GRIN metamaterial lenslet array and mounted it on a Polarbear/Simons Array 90/150~GHz band transition edge sensor (TES) bolometer detector array with sinuous planar antennas. Beam measurements of a prototype lenslet array agree reasonably well with the model simulations. We plan to further optimize the design and combine it with a broadband anti-reflection coating to achieve operation over 70--350~GHz bandwidth.