论文标题
Au涂层的Si Nanowafer的机械性能:一项原子研究
Mechanical Properties of Au Coated Si Nanowafer: an Atomistic Study
论文作者
论文摘要
金黄色和硅纳米系统的组合引起了科学界的巨大兴趣,因为它在不同的金属 - 孔导体电子设备和太阳能驱动的水分拆分细胞中的应用。硅在金层上制造,易于其表面的金原子扩散。在这项研究中,通过执行分子动力学拉伸和压缩模拟来研究金涂层硅纳米瓦的机械性能的详细分析。观察到纳米诺夫的温度,金涂层厚度,应变速率和晶体学方向对机械性能的影响。发现最终的拉伸强度和抗压强度都与温度相反。纳米诺夫主要是通过沿{110}平面滑动而导致的,因为剪切过多,当沿[100]方向加载过多,而混合滑动和裂纹类型的故障发生了300k。在张力期间,在金层中观察到从FCC到HCP晶体的有趣的晶体学转变。还研究了应变速率在张力和压缩中的影响。最后,硅的晶体取向变化,并研究了张力压缩不对称旅馆的金涂层硅纳米瓦剂。在沿[110]晶体方向加载的情况下,观察到反向压缩不对称性。破坏机制表明,在压缩过程中发生有趣的晶体转化,导致材料早期产生。
Combined gold and silicon nano-system has spurred tremendous interest in the scientific community due to its application in different metal-semiconductor electronic devices and solar driven water splitting cells. Silicon, fabricated on gold layer, is prone to gold atom diffusion at its surface. In this study, detailed analysis of mechanical properties of gold coated silicon nanowafer is studied by performing molecular dynamics tensile and compressive simulations. The effects of temperature, gold coating thickness, strain rate and crystallographic orientation of silicon on the mechanical properties are observed for the nanowafer. It is found that both the ultimate tensile and compressive strength show inverse relationship with temperature. The nanowafer fails mainly by slipping along {110} plane due to excessive shear when loaded in [100] direction while a mixed slip and crack type failure occurs for 300K. Interesting crystallographic transformation from fcc to hcp crystal is observed in gold layer for the highest gold layer thickness during tension. The effects of strain rate in tension and compression is also studied. Finally, the crystal orientation of silicon is varied and the tension-compression asymmetry inn the gold coated silicon nanowafer is investigated. Reverse tension-compression asymmetry is observed in case of loading along [110] crystal orientation. The failure mechanism reveals that interesting crystal transformation of silicon occurs during compression leading to early yielding of the material.