论文标题

绝缘不当铁电域壁作为强大的屏障层电容器

Insulating improper ferroelectric domain walls as robust barrier layer capacitors

论文作者

Puntigam, Lukas, Schultheiß, Jan, Strinic, Ana, Yan, Zewu, Bourret, Edith, Altthaler, Markus, Kezsmarki, Istvan, Evans, Donald M., Meier, Dennis, Krohns, Stephan

论文摘要

我们报告了不当铁电H-ermno $ _3 $的介电属性。从大量表征中,我们观察到具有两个不同弛豫的特征的温度和频率范围,从而导致介电介电常数的高甚至“巨大”值。一个特征在电极样本界面上源自在电极样本界面上形成Schottky屏障,而第二个特征与内部屏障层电容(BLC)有关。内部BLC的计算体积分数(8%)与观察到的绝缘域壁(DWS)的体积分数非常吻合。虽然确定绝缘DW可以产生高介电常数,但研究通常集中在适当的铁电源上,电场可以去除DWS。相比之下,在H-ermno $ _3 $中,绝缘DW受到拓扑保护,在基本上更高的电场下促进了操作。我们的发现为在概念上使用域内的材料进行了概念上的新方法,该方法在不正确的铁蛋白中使用域壁表现出巨大的介电渗透率,并具有潜在的电磁电容器中的应用。

We report the dielectric properties of improper ferroelectric h-ErMnO$_3$. From the bulk characterisation we observe a temperature and frequency range with two distinct relaxation-like features, leading to high and even 'colossal' values for the dielectric permittivity. One feature trivially originates from the formation of a Schottky barrier at the electrode-sample interface, whereas the second one relates to an internal barrier layer capacitance (BLC). The calculated volume fraction of the internal BLC (of 8 %) is in good agreement with the observed volume fraction of insulating domain walls (DWs). While it is established that insulating DWs can give rise to high dielectric constants, studies typically focused on proper ferroelectrics where electric fields can remove the DWs. In h-ErMnO$_3$, by contrast, the insulating DWs are topologically protected, facilitating operation under substantially higher electric fields. Our findings provide the basis for a conceptually new approach to engineer materials exhibiting colossal dielectric permittivities using domain walls in improper ferroelecctrics with potential applications in electroceramic capacitors.

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