论文标题
铁电H-ymno $ _3 $薄膜的外延整合在异质结构中
Epitaxial integration of improper ferroelectric h-YMnO$_3$ thin films in heterostructures
论文作者
论文摘要
我们报告了脉冲激光沉积（PLD）的薄膜和异质结构的不当铁六边形YMNO $ _3 $（YMO）薄膜和异质结构的多种基本定性改进。通过将增长前基材退火和低能氟化PLD结合在一起，我们在Yttria稳定的氧化锆（YSZ）上获得了YMO膜的二维生长模式，并具有超级粗糙度，并且没有不良的纳米晶体含量。通过在基材和最终薄膜之间插入带有二键蛋白氧化物的牺牲锰层，后者以完全晶格 - 重质模式的模式生长，因此，没有任何不合适的脱位，同时保持了直接在预先播放的YSZ上生长的膜的非凡平坦性。这为基于六角锰矿的杂质结构提供了一个模板，作为有前途的多表情类别，具有不当的室温铁电性，并将其实施到技术相关的外观外观金属|铁反电视型多层型中。
We report on multiple fundamental qualitative improvements in the growth of improper ferroelectric hexagonal YMnO$_3$ (YMO) thin films and heterostructures by pulsed laser deposition (PLD). By a combination of pre-growth substrate annealing and low-energy-fluence PLD, we obtain a two-dimensional growth mode of the YMO films on yttria-stabilized zirconia (YSZ) with ultralow roughness and devoid of misoriented nanocrystalline inclusions. By inserting a sacrificial manganite layer capped with conducting indium-tin oxide between the substrate and the final film, the latter is grown in a fully lattice-relaxed mode and, thus, without any misfit dislocations while maintaining the extraordinary flatness of the films grown directly on pre-annealed YSZ. This provides a template for the fabrication of heterostructures based on hexagonal manganites as promising class of multiferroics with improper room-temperature ferroelectricity and the implementation of these into technologically relevant epitaxial metal|ferroelectric-type multilayers.
