论文标题
范德华的形态控制二尿素拓扑绝缘子的外观外观
Morphology Control in van der Waals Epitaxy of Bismuth Telluride Topological Insulators
论文作者
论文摘要
作为拓扑绝缘子的原型,别尔斯特氏菌已经重新引起了人们的重视。高质量的薄膜已被研究为新型Spintronic设备的基本平台。别匹马的迁移率和高解吸系数构成了一种场景,其中生长参数对膜的结构和电子特性具有巨大影响。最近[J。物理。化学C 2019,123,24818-24825],对这种材料外延膜中缺陷的动态进行了详细的研究,揭示了薄膜/底物晶格失误对膜横向相干性的影响。与观察到的相反,预计非常小的格子不合适(<0.05%)对外延系统的质量没有影响,而原子层则与观察到的原子层相互弱粘合。在这项工作中,我们研究了晶状体失调与薄膜晶体域的大小和形态之间的相关性。通过同步子X射线获得的薄膜布拉格反射的三维相互空间图用于通过膜厚度可视化晶体域的空间构象,而原子力显微镜图像可直接提供膜表面域形态的信息。
Bismuth telluride have regained significant attention as a prototype of topological insulator. Thin films of high quality have been investigated as a basic platform for novel spintronic devices. Low mobility of bismuth and high desorption coefficient of telluride compose a scenario where growth parameters have drastic effects on structural and electronic properties of the films. Recently [J. Phys. Chem. C 2019, 123, 24818-24825], a detailed investigation has been performed on the dynamics of defects in epitaxial films of this material, revealing the impact of film/substrate lattice misfit on the films' lateral coherence. Very small lattice misfit (<0.05%) are expected to have no influence on quality of epitaxial system with atomic layers weakly bonded to each other by van der Waals forces, contrarily to what was observed. In this work, we investigate the correlation between lattice misfit and size and morphology of the film crystalline domains. Three-dimensional reciprocal-space maps of film Bragg reflections obtained with synchrotron X-rays are used to visualize the spatial conformation of the crystallographic domains through film thickness, while atomic force microscopy images provide direct information of the domains morphology at the film surface.