论文标题
通过扫描热门显微镜在2D材料纳米结构中直接映射局部Seebeck系数
Direct Mapping of Local Seebeck Coefficient in 2D Material Nanostructures via Scanning Thermal Gate Microscopy
论文作者
论文摘要
低维材料的纳米结构和设备中Seebeck系数的局部变化在其热电性能中起主要作用。不幸的是,目前大多数热电测量探测了整个设备的骨料特性,未能观察到局部变化和内部结构的影响。这种变化可能是由局部缺陷,几何形状,电触点或界面引起的,并且通常会实质上影响热电特性,最大程度地影响了二维(2D)材料。在这里,我们使用扫描热门显微镜(STGM),这是一种非侵入性方法,不需要纳米级尖端和探测样品之间的电接触,以获得石墨烯样品中热电电压的纳米级分辨率2D映射。我们研究了单层和双层石墨烯之间形成的结,并使用反卷积方法直接映射局部Seebeck系数,并通过触点固定内部应变和费米水平固定的影响。新方法为对2D材料纳米结构和设备中热电行为和现象的深入了解为铺平了道路。
Local variations in the Seebeck coefficient in low-dimensional materials-based nanostructures and devices play a major role in their thermoelectric performance. Unfortunately, currently most thermoelectric measurements probe the aggregate characteristics of the device as a whole, failing to observe the effects of the local variations and internal structure. Such variations can be caused by local defects, geometry, electrical contacts or interfaces and often substantially influence thermoelectric properties, most profoundly in two-dimensional (2D) materials. Here, we use Scanning Thermal Gate Microscopy (STGM), a non-invasive method not requiring an electrical contact between the nanoscale tip and the probed sample, to obtain nanoscale resolution 2D maps of the thermovoltage in graphene samples. We investigate a junction formed between single-layer and bilayer graphene and identify the impact of internal strain and Fermi level pinning by the contacts using a deconvolution method to directly map the local Seebeck coefficient. The new approach paves the way for an in-depth understanding of thermoelectric behaviour and phenomena in 2D materials nanostructures and devices.