论文标题

超短激光诱导的微刺激位点的微拉曼光谱

Micro-Raman spectroscopy of ultrashort laser induced microexplosion sites in silicon

论文作者

Smillie, L. A., Niihori, M., Rapp, L., Haberl, B., Williams, J. S., Bradby, J. E., Pickard, C. J., Rode, A. V.

论文摘要

通过强大的超短激光脉冲在硅中诱导的密闭微爆炸会导致新的SI相。其中一些以前没有通过硅的接近平衡压缩观察到。在这项研究中,已经进行了对微爆炸阵列的共焦拉曼微光谱和拉曼成像,以搜索这些新型硅的新同种异体的拉曼特征。在厚厚的二氧化硅约束层和下面的硅之间的界面上产生了微爆炸。它的特征是在压缩硅区域上方的界面处的空隙。拉曼数据显示,修改后的硅内硅相的丰富组装。在修改中,在修改中最高4.5 GPA的残留应力是根据主钻石立方体Si Raman峰的变化确定的。许多SI同素体的计算出的拉曼光谱与实验光谱显示出合理的一致性。硅(菱形R8和以人体为中心的BC8)相似的两个结构相似的四方阶段以及最近发现的BT8-SI都很可能包含在许多激光修饰地点的拉曼光谱中。尽管以前在我们的电子衍射研究中观察到的ST12-SI相对于高度压缩应力的激光改性区域,但并未从拉曼数据中可靠地鉴定出来,但我们建议这可能是由于电子衍射和拉曼光谱分析的位点中残留应力水平的可能差异所致。观察到其他几个未识别的拉曼峰,表明存在其他未知的硅相。预计所有这些硅相都有吸引人的半导体特性,包括狭窄的带隙,可以打开新的应用。

Confined microexplosions induced in silicon by powerful ultrashort laser pulses can lead to new Si phases. Some of these have not previously been observed via near-equilibrium compression of silicon. In this study, confocal Raman micro-spectroscopy and Raman imaging of arrays of microexplosions have been conducted to search for Raman signatures of these novel allotropes of silicon. A microexplosion is generated at the interface between a thick silicon dioxide confinement layer and underlying silicon. It is characterised by a void at the interface above a region of compressed silicon. Raman data show a rich assembly of silicon phases within the modified silicon. Residual stresses up to 4.5 GPa in the modifications have been determined from the shift in the main diamond-cubic Si Raman peak. The computed Raman spectra for a number of Si allotropes show reasonable agreement with the experimental spectra. Two structurally similar tetragonal phases of silicon (the rhombohedral r8 and the body-centred bc8) phases as well as recently identified bt8-Si are all highly likely to be contained in Raman spectra from many laser-modified sites. Although the st12-Si phase, previously observed in our electron diffraction studies of the highly compressively stressed laser-modified regions, was not reliably identified from Raman data, we suggest this could be due to the possible difference in residual stress level in the sites analysed by the electron diffraction and Raman spectra. Several other unidentified Raman peaks were observed, suggesting the presence of other unknown silicon phases. All of these silicon phases are expected to have attractive semiconducting properties including narrow band gap that open up novel applications.

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