论文标题
沉积系统的紧凑型旋转基材加热器的设计和构建
Design and construction of a compact rotary substrate heater for deposition systems
论文作者
论文摘要
我们已经为温度范围从25 $^\ CIRCE $ C到700 $^\ Circ $ c设计并构建了紧凑的旋转基板加热器。加热器可以在需要结晶样品的任何沉积系统中实现。它的主要功能是在膜生长期间提供原位热处理。温度由与K型热电偶相连的温度控制器监测和控制。加热器外壳旨在容纳电阻元件，同时允许基板支架自由旋转。旋转不仅对于沉积过程中的薄膜均匀性至关重要，而且对于消除基材上的温度梯度也至关重要。为了耐受氧化和腐蚀性环境，该仪器是由不锈钢制成的，它也可以用作“冷却液”，利用散热。该仪器在长时间内表现良好，温度稳定。我们希望该项目对于希望拥有紧凑型旋转加热器的实验室很有用，该实验室满足晶体生长和膜均匀性的要求。
We have designed and constructed a compact rotary substrate heater for the temperature range from 25 $^\circ$C to 700 $^\circ$C. The heater can be implemented in any deposition system where crystalline samples are needed. Its main function is to provide a heat treatment in situ during film growth. The temperature is monitored and controlled by a temperature controller coupled to a type K thermocouple. A heater case was designed to host a resistive element and at the same time to allow the substrate holder to freely rotate. Rotation is crucial not only for film homogeneity during deposition but also for the elimination of temperature gradients on the substrate holder. To tolerate oxidizing and corrosive environments, the instrument was made of stainless steel which also works as "coolant" taking advantage of heat dissipation. The instrument performs well for long periods of time with stable temperatures. We hope that this project is useful for laboratories wishing to have a compact rotary heater that meets the requirements for crystal growth and film homogeneity.
