论文标题

热和照片退火在GE30SE55BI15薄膜的非线性光学响应中的作用

Role of thermal and photo annealing on nonlinear optical response of Ge30Se55Bi15 thin films

论文作者

Aparimita, Adyasha, Khan, Pritam, Aswin, J. R., Adarsh, K. V, Naik, R.

论文摘要

在本文中,我们采用了纳秒Z扫描技术来证明热和照片退火后GE30SE55BI15薄膜中的非线性光学响应。依赖强度的开放孔径z扫描痕迹表明,对于所有样品,即准备好的,热的,热和照片退火薄膜表现出可反向饱和吸收(RSA)。实验结果表明,与制备样品相比,可以有效地使用热和光退火来增强非线性吸收系数。我们进一步证明,在较高的强度下,热退火和制备样品的β值显着增加。相反,照片退火样品的beta没有针对强度变化的明显变化。

In this article, we employed nanosecond Z-scan technique to demonstrate the nonlinear optical response in Ge30Se55Bi15 thin films after thermal and photo annealing. The intensity dependent open aperture Z-scan traces reveal that for all the samples, i.e. as-prepared, thermal and photo annealed thin films exhibit reverse saturable absorption (RSA). The experimental results indicate that both thermal and photo annealing can be efficiently used to enhance the nonlinear absorption coefficient compared to as-prepared sample. We further demonstrate that beta value of thermally annealed and as-prepared samples increase significantly at higher intensities. On the contrary, beta for photo annealed sample does not exhibit appreciable changes against the intensity variation.

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