论文标题

UV激光的修饰和选择性离子梁蚀刻无定形钒五氧化物薄膜

UV-laser modification and selective ion-beam etching of amorphous vanadium pentoxide thin films

论文作者

Cheremisin, Alexander, Putrolaynen, Vadim, Velichko, Andrei, Pergament, Alexander, Kuldin, Nikolay, Grishin, Alexander

论文摘要

我们介绍了对五氧化聚氧化聚氧化聚氧化钒膜的准分子激光修饰和模式的结果。使用湿阳性抗抗型和Ar离子束负抗型蚀刻技术来开发紫外线修饰的膜。与标准电子材料相比,发现V2O5膜具有足够的电阻率

We present the results on excimer laser modification and patterning of amorphous vanadium pentoxide films. Wet positive resist-type and Ar ion-beam negative resist-type etching techniques were employed to develop UV-modified films. V2O5 films were found to possess sufficient resistivity compared to standard electronic materials thus to be promising masks for sub-micron lithog-raphy

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